Deposition Components

The NL UHV sources for nanoparticle deposition of single materials (NL-D1, NL-D2) or alloys (NL-D3) are suitable for nanoparticles in the 1-20 nm range – maximising the particles’ surface area to bulk ratio, ideal for instance for catalysis. The sources include a magnetron, aggregation zone with differential pumping port (pump optional), and an expansion zone. A dedicated quadrupole mass spectrometer is optionally available for mass selection.

The EVAP-4 mini ebeam evaporator can co-evaporate up to four materials from one source (DN40CF or DN63CF mount) using a single power supply. It’s ideal for upgrading MBE or deposition systems, adding flexibility for depositing metals from Al to Zr, including high-melting-point materials like Nb. The compact design features a cooled pocket enclosure with low heat load, enabling single-phase controlled co-evaporation. Ideal for depositing lithography contacts.

The Stellar range of UHV magnetrons are fully bakeable (including the magnet) and are available on DN63CF or DN100CF flanges. The Tri-Stellar is a unique compact 3-target source, flange-mounted on a DN100CF, featuring three 1-inch targets with independent control. The system is compatible with DC, RF, Pulsed DC, and HiPIMS power supplies, providing exceptional flexibility for multi-material deposition in ultra-high vacuum environments.

Looking for a PVD system?

Benchtop and custom HV/UHV PVD systems for nanoparticle and thin film deposition, built around your research needs.